Chromatographic Separation of Niobium and Tantalum in a Hydrofluoric Acid-Hydrochloric Acid System with Macroporous Polyacrylate Resin Beads.

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Etching with Hydrofluoric Acid

Photoresists, wafers, plating solutions, etchants and solvents ... Phone: +49 731 977343 0 www.microchemicals.eu [email protected] Etching of SiO2, Quartz, and Glasses with HF Hydrofluoric acid is the only etchant which attacks amorphous SiO2, quartz, or glasses at significant high etch rate. However, HF is not only a strong corrosive, but also highly toxic towards higher concentrations: ...

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Etching with Hydrofluoric Acid

Photoresists, developers, remover, adhesion promoters, etchants, and solvents ... Phone: +49 731 36080-409 www.microchemicals.eu e-Mail: [email protected] Etching of SiO2, Quartz, and Glasses with HF Hydrofluoric acid is the only etchant which attacks amorphous SiO2, quartz, or glasses at significant high etch rate. However, HF is not only a strong corrosive, but also highly toxic towards...

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Separation of Hafnium From Zirconium by Anion Exchange

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Improved Resin–Zirconia Bonding by Room Temperature Hydrofluoric Acid Etching

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ژورنال

عنوان ژورنال: Analytical Sciences

سال: 1995

ISSN: 0910-6340,1348-2246

DOI: 10.2116/analsci.11.23